パルスレーザー堆積法によるFeSe薄膜作製 手順の改善に向けて

パルスレーザー堆積法によるFeSe薄膜作製 手順の改善に向けて

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フロンティア材料研究所 Silvia Haindl特任准教授小畑由紀子特任助教の国際共著論文
“Challenges for Pulsed Laser Deposition of FeSe Thin Films”
が、 Micromachines  に掲載されました。(DOI: 10.3390/mi12101224

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<Abstract>
Anti-PbO-type FeSe shows an advantageous dependence of its superconducting properties with mechanical strain, which could be utilized as future sensor functionality. Although superconducting FeSe thin films can be grown by various methods, ultrathin films needed in potential sensor applications were only achieved on a few occasions. In pulsed laser deposition, the main challenges can be attributed to such factors as controlling film stoichiometry (i.e., volatile elements during the growth), nucleation, and bonding to the substrate (i.e., film/substrate interface control) and preventing the deterioration of superconducting properties (i.e., by surface oxidization). In the present study, we address various technical issues in thin film growth of FeSe by pulsed laser deposition, which pose constraints in engineering and reduce the application potential for FeSe thin films in sensor devices. The results indicate the need for sophisticated engineering protocols that include interface control and surface protection from chemical deterioration. This work provides important actual limitations for pulsed laser deposition (PLD) of FeSe thin films with the thicknesses below 30 nm.